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Site specific residual stress analysis using focused ion beam machining

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If you have a question about this talk, please contact Stephen Walley.

Focused ion beam systems are versatile tools for micro and nanoengineering. Here two simple FIB based methods are reported for site specific residual stress analysis. In addition, the amount of stress induced in silicon through FIB milling and implantation will be discussed.

This talk is part of the Physics and Chemistry of Solids Group series.

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