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Block copolymer directed self-assembly for lithographic applications

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Demand for ever smaller critical dimensions in the electronic devices continue pressing conventional photolithography beyond the diffraction limit. Scientific and technological challenges arise as resolution requirements approach molecular length scales and the economics of new lithographic technologies become prohibitively expensive. Self-assembling structures at the nanometer scale have emerged as a way to overcome these limitations. Block copolymer, which self-assembles a wide variety of periodic nano-domain structures, stands out as a promising alternative to produce features in the 10nm scale. In this paper, methods such as graphoepitaxy and chemical registration proposed to precisely control the self-assembly of block copolymer are overviewed and potential of the technology is discussed focusing on pattern density multiplication technique for lithographic application.

Biography HY received Dr. of Eng. degree in polymer chemistry from Kyoto University in 1992. In 1993, he joined Hashimoto Polymer Phasing Project, ERATO , Japan Science & Technology Organization. In 1998, he became a research staff in Hitachi Research Laboratory, Hitachi Ltd. and currently is a Chief Researcher.

References 1) Polymer 50, 4250–4256 (2009). 2) Macromolecules 41, 9267-9276 (2008). 3) Langmuir 23, 6404-6410 (2007).

This talk is part of the MRC/Hitachi Seminars series.

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