Abstract

Adapting existing manufacturing methods to emerging forms of large-area electronics presents major technological and economic challenges. Despite the difficulties, several new processing concepts have gained ground, transforming the broader marketplace and relevant manufacturing infrastructure. In this talk, I will discuss our recent work toward advancing scalable manufacturing of large-area electronics with nanometer-scale critical device features. I will show how combining innovative patterning technologies with scalable material processing methods and engineered nanomaterials can lead to more sustainable optoelectronic devices with extraordinary performance characteristics. Particular emphasis will be placed on developing scalable lithography techniques and their use in an expanding range of applications, from ultra-fast optoelectronics to chemical reactors and biosensors.